Diffractive grey-tone phase masks for laser ablation lithography
- 30 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 453-460
- https://doi.org/10.1016/s0167-9317(01)00467-1
Abstract
No abstract availableKeywords
Funding Information
- Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung
This publication has 4 references indexed in Scilit:
- New developments and applications in the production of 3D microstructures by laser micromachiningPublished by SPIE-Intl Soc Optical Eng ,1999
- Line width control using a defocused low voltage electron beamMicroelectronic Engineering, 1999
- Chromium Mask Damage In Excimer Laser Projection ProcessingPublished by SPIE-Intl Soc Optical Eng ,1988
- Excimer laser etching of polyimideJournal of Applied Physics, 1985