Influence of an Oxidizing Annealing Ambient on the Distribution of As, Sb, and Ga Implanted into Silicon
- 1 September 1975
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 122 (9) , 1234-1238
- https://doi.org/10.1149/1.2134432
Abstract
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