Use of x-ray emission spectroscopy in the characterization of thin films of aluminum oxides and hydroxides
- 1 March 1967
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 2 (3) , 395-398
- https://doi.org/10.1016/0025-5408(67)90022-0
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Diagram and Nondiagram Lines in K Spectra of Aluminum and Oxygen from Metallic and Anodized AluminumJournal of Applied Physics, 1965
- Silicon valence in SiO films studied by X-ray emissionSolid State Communications, 1964