Abstract
The author reviews the use of public domain TCAD tools (SUPREM and PISCES) for advanced bipolar process development. The simulators are utilized for device design and optimization, sensitivity analysis, and AC and DC parameter extraction. The various bipolar parameters that can be obtained from simulation are discussed. PISCES has been enhanced to model Si/sub 1-x/Ge/sub x/ heterojunction bipolar device structures. Some preliminary simulations of SiGe structures are presented.

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