I n s i t u x-ray photoelectron spectroscopic study of remote plasma enhanced chemical vapor deposition of silicon nitride on sulfide passivated InP
- 1 July 1990
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 8 (4) , 848-855
- https://doi.org/10.1116/1.584977
Abstract
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