Effect of radio‐frequency‐induced substrate biasing on the microstructure of palladium films

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Abstract
Palladium films were deposited by dc planar magnetron sputtering while biasing the film substrate. The pseudodielectric function of the films was measured by spectroscopic ellipsometry in the spectral range 1.5–6.0 eV. The films were best described by the two‐dimensionally isotropic Sen, Scala, and Cohen effective medium theory. With increasing rf‐induced substrate biasing the Pd film microstructure was modified in a manner similar to that obtained by varying the film–substrate temperature alone.

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