Some factors affecting depth profiling measurements using Auger electron spectroscopy
- 31 July 1975
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 51 (1) , 328-332
- https://doi.org/10.1016/0039-6028(75)90259-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Comparison of Auger spectra of Mg, Al, and Si excited by low−energy electron and low−energy argon−ion bombardmentJournal of Vacuum Science and Technology, 1975
- Use of Auger Electron Spectroscopy and Inert Gas Sputtering for Obtaining Chemical ProfilesJournal of Vacuum Science and Technology, 1972