Preparation of crystalline SiC thin films by plasma-enhanced chemical vapour deposition and by ion beam modification of silicon
- 15 January 1992
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 11 (1-4) , 79-82
- https://doi.org/10.1016/0921-5107(92)90195-f
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Development of a high-brightness gas field-ionization sourceNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Ionographic patterns with amorphous/crystalline contrastApplied Physics A, 1987