The structures and interfaces of TiN films prepared by hollow cathode discharge ion plating technique

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Abstract
Two groups of Ti–N films were studied: one was deposited by hollow cathode discharge (HCD) onto high-speed steel and 18–8 stainless steel with different N2 flow rates in order to investigate the influence of Ti/N ratio and the kind of substrate on the structure, the other was first deposited onto as-annealed GCr15 (steel 52100) by HCD and magnetron sputtering, respectively, and then quenched in Ar atmosphere, with the aim of studying the changes in structures of coatings and the interfacial regions during heat treatment, and to compare the influence of different physical vapor deposition methods. The crystallographic features of structures and residual stress of TiN films were examined by x-ray diffraction. Auger electron spectroscopy and x-ray photoelectron spectroscopy were used to determine their composition and to characterize the features of interfacial regions. It was found that the coatings consist mainly of TiN phase. With decreasing N2 flow rate, Ti2N phase appeared and the microhardness increased as well, and the preferred orientation axis, vertical to the film plane, changed from (200) to (113) and then to (111). A tensile residual stress was found in the coatings. There was no evidence for a change in structures or of interfaces of TiN coatings on GCr15 steel after subsequent heat treatment.

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