Small-area high-current-density Josephson junctions

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Abstract
Josephson junctions with areas of ∼10−9 cm2 and current densities of 105 A/cm2 are described. The junctions were patterned using a combination of optical lithography and oblique evaporation techniques. The junction width is limited by the lithographic resolution to about 1 μm. The junction length is determined essentially by the base‐electrode film thickness and can be as small as 1000 Å. The moderate (∼10 Ω) normal resistances of these junctions combined with their short intrinsic RC times gives them potential for application in nonlatching Josephson logic and in quasiparticle mm‐wave mixers.