Vacuum-deposited thin-metal-film disk
- 15 March 1984
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 55 (6) , 2254-2256
- https://doi.org/10.1063/1.333627
Abstract
The fabrication process used in an all‐vacuum‐deposition thin‐metal‐film disk will be described. The process consists of planar dc‐magnetron sputter deposition of a stainless alloy undercoat onto a 14‐in.‐diameter AlMg‐4 disk substrate, e‐beam evaporation of an Fe–Co–Cr alloy magnetic layer at an oblique angle of incidence, planar dc‐magnetron sputter deposition of a rhodium overcoat and spray deposition of a liquid lubricant layer. Some mechanical and magnetic performance characteristics of disks, deposited in that fashion, are described.This publication has 1 reference indexed in Scilit:
- Production process and high density recording characteristics of plated disksIEEE Transactions on Magnetics, 1982