Growth Mechanisms of YBa2Cu3O\ssmbix Films Prepared by RF Thermal Plasma Evaporation
- 1 March 1996
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 35 (3R) , 1706-1711
- https://doi.org/10.1143/jjap.35.1706
Abstract
YBa2Cu3O x films prepared by rf thermal plasma evaporation exhibited spiral growth in a wide range of deposition conditions from observations by atomic force microscopy (AFM). However, surface morphology, for example, step width (λ), grain size, and grain shape, varied with deposition conditions. Because surface morphology is affected by growth mechanisms, growth mechanisms can be elucidated by analyzing the change in morphology with deposition conditions. In this study, we investigated the relationship between λ and deposition conditions from a viewpoint of supersaturation. As a result, λ increased with increasing substrate temperature and decreasing raw powder feeding rate, decreasing supersaturation in both cases. In addition, the change in λ and growth rates was explained well by the change in supersaturation using a model based on the BCF theory.Keywords
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