Emergence and development of chlorhexidine resistance during sporulation of Bacillus subtilis 168
- 1 June 1988
- journal article
- Published by Oxford University Press (OUP) in FEMS Microbiology Letters
- Vol. 51 (1) , 73-76
- https://doi.org/10.1016/0378-1097(88)90232-7
Abstract
During sporulation of Bacillus subtilis strain 168 initiated by step-down conditions, resistance to chlorhexidine diacetate (CHA) developed at about t3.5, before heat but after toluene resistance. Mutants blocked at stage IV of sporulation were sensitive to all three treatments. Stage V mutants were toluene resistant but moderately sensitive to heat and CHA. A stage VI mutant was resistant to all three treatments. Thus, chlorhexidine resistance is likely to be a result of spore coat, rather than of cortex, development.Keywords
This publication has 0 references indexed in Scilit: