Temperature influence on the formation of silanized monolayers on silica: an atomic force microscopy study
- 15 May 1996
- journal article
- Published by Elsevier in Surface Science
- Vol. 352-354, 369-373
- https://doi.org/10.1016/0039-6028(95)01162-5
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- An Intrinsic Relationship between Molecular Structure in Self-Assembled n-Alkylsiloxane Monolayers and Deposition TemperatureThe Journal of Physical Chemistry, 1994
- Octadecyltrichlorosilane monolayers as ultrathin gate insulating films in metal-insulator-semiconductor devicesApplied Physics Letters, 1993
- Evidence of a transition temperature for the optimum deposition of grafted monolayer coatingsNature, 1992
- Silanation of silica surfaces. A new method of constructing pure or mixed monolayersLangmuir, 1991
- Self-Assembled Organic Monolayers: Model Systems for Studying Adsorption of Proteins at AurfacesScience, 1991
- Evidence for a new spreading regime between partial and total wettingPhysical Review Letters, 1991
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989
- On the formation and structure of self-assembling monolayersJournal of Colloid and Interface Science, 1986
- Coverage of Si substrates by self-assembling monolayers and multilayers as measured by IR, wettability and X-ray diffractionThin Solid Films, 1985
- On the formation and structure of self-assembling monolayers. I. A comparative atr-wettability study of Langmuir—Blodgett and adsorbed films on flat substrates and glass microbeadsJournal of Colloid and Interface Science, 1984