Anodic Film Growth by Anion Deposition in Aluminate, Tungstate, and Phosphate Solutions
- 1 January 1963
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 110 (8) , 853-855
- https://doi.org/10.1149/1.2425890
Abstract
Films were obtained by anodic treatment of Al, Mg, Ni, Fe, Zn, Bi, Cd, Co, and Cu in and Al, Bi, Cd, Cu, and Zn in . A formation voltage of 30v was applied for 10 min in all cases except Al in where the maximum formation voltage was 100v. The anodic films were studied by electron diffraction and chemical analyses. Films obtained in solution appeared to be , and those obtained in solution were oxides of the anode metal, or mixtures of the anode metal oxide with . The incorporation of phosphorus compounds in anodic films formed on Al in solutions was also observed. The mechanism of anion deposition and film growth in these solutions is discussed.Keywords
This publication has 0 references indexed in Scilit: