Application of electron beam wobbling to SR X-ray lithography
- 1 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 105-108
- https://doi.org/10.1016/0167-9317(89)90024-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Focusing of synchrotron radiationNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1987
- An Electron Undulating Ring for VLSI LithographyIEEE Transactions on Nuclear Science, 1985
- Italienischer HumanismusArchiv für Kulturgeschichte, 1970