The photoinduced metallo-organic decomposition process: a novel technique for dielectric thin-film growth
- 1 December 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 13 (12) , 609-611
- https://doi.org/10.1109/55.192860
Abstract
A novel photoinduced metallo-organic decomposition (PIMOD) process has been developed for growing high-quality lithium niobate films on silicon or sapphire substrates. Crack- and interdiffusion-free films have been grown by the PIMOD process at a lower temperature for a shorter processing time than those required for the conventional MOD process. The electrical, optical, and electrooptical properties of the PIMOD-derived films are reported.Keywords
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