Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks

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Abstract
Using image restoration techniques, we report on an algorithm for determining the optimum correction of original masks, which are to be reduced by a given microphotographic system, in order to compensate for the system's distortion. The film is assumed highly nonlinear. As an example, we compute the profile of serifs that should be added to corners to compensate for distortion in a diffraction-limited imaging system.

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