D.C. reactively sputtered iron oxide films for selectively semitransparent photomasks II: Relation between the structure of the films and their mechanical and chemical properties
- 1 April 1980
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 67 (1) , 135-144
- https://doi.org/10.1016/0040-6090(80)90297-7
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- D.C. reactively sputtered iron oxide films for selectively semitransparent photomasks I: Deposition conditions and optical properties of the filmsThin Solid Films, 1980
- Chemical Vapor Deposition of Iron Oxide Films for Use as Semitransparent MasksJournal of the Electrochemical Society, 1971