Improved inhibit patterning of YBa2Cu3O7 thin films
- 21 December 1992
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (25) , 3041-3043
- https://doi.org/10.1063/1.108003
Abstract
We present an improved reaction patterning technique to fabricate very stable thin film devices of YBaCuO on various substrates. Our approach includes in situ patterning and completely avoids the contact between YBaCuO superconductor and chemical or physical etchants. Very thin, high quality YBaCuO structures are grown on ridges or in trenches and in situ protected by passivating layers, demonstrating excellent long term stability.Keywords
This publication has 3 references indexed in Scilit:
- Reaction patterning of YBa2Cu3O7−δ thin films on SiApplied Physics Letters, 1990
- Comparison of YBCO-films prepared by laser ablation and sputteringJournal of the Less Common Metals, 1990
- Novel method of patterning YBaCuO superconducting thin filmsApplied Physics Letters, 1989