Photodegradation of Poly(methacrylates), Poly(acrylates) and Polystyrene Derivatives by 146nm Light.
- 1 January 2000
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 13 (5) , 751-757
- https://doi.org/10.2494/photopolymer.13.751
Abstract
Photodegradation of acrylate, methacrylate, and styrene type polymers was investigated under nitrogen using 146nm light from Kr2 excimer lamp. Photochemical reactivity of poly(methacrylates) and poly(acrylates) was dependent on the structure of the ester units. Cleavage of ester units and formation of double bonds were observed. Decrease of film thickness due to ablation was observed. Poly(methacrylates) films irradiated at 146nm were soluble in tetrahydrofuran (THF) but irradiated poly(acrylates) films were not soluble. Thickness decrease of styrene based polymer films did not occur on irradiation with 146nm light. The irradiated polystyrene film was insoluble in THF but poly(α-methylstyrene) film was soluble in THF after irradiation. The irradiated poly(p-hydroxystyrene) and poly(p-hydroxy-α-methylstyrene) films were insoluble in THF. It was found that tertiary hydrogen atoms in the main chain and phcnolic OH groups participated in crosslinking of the polymers.Keywords
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