The Ultimate Reflectance of Multilayer Dielectric Mirrors
- 1 April 1978
- journal article
- research article
- Published by Taylor & Francis in Optica Acta: International Journal of Optics
- Vol. 25 (4) , 291-298
- https://doi.org/10.1080/713819785
Abstract
The theory of multilayer dielectric mirrors with residual absorptance is re-examined to determine whether lower absorptances and therefore higher reflectances can be achieved than with the usual type of alternating quarter-wave system. It is shown that considerable improvements are indeed possible if the layers of the material with high refractive index and residual absorption are made with optical thickness less than a quarter-wave, and the other layers with correspondingly greater optical thickness. Simple formulae are derived for the factor of improvement and the required optical thickness of the films of low refractive index. Moreover, by applications of the concept of potential transmittance and the principle of equivalent layers, a relationship is established between the desired limiting reflectance of the system and the necessary number of layers.Keywords
This publication has 8 references indexed in Scilit:
- Loss mechanisms in dielectric optical interference devicesApplied Optics, 1977
- Optical coating design with reduced electric field intensityApplied Optics, 1977
- Calculation of the electric field and absorption distributions in thin film structuresThin Solid Films, 1976
- Laser damage of CdS and ZnS thin filmsThin Solid Films, 1976
- Properties of Weakly Absorbing Multilayer Systems in Terms of the Concept of Potential TransmittanceOptica Acta: International Journal of Optics, 1973
- Theory of Induced-Transmission Filters in Terms of the Concept of Equivalent LayersJournal of the Optical Society of America, 1972
- Optical applications of dielectric thin filmsReports on Progress in Physics, 1970
- Zur Theorie der Wechselschichten aus schwachabsorbierenden Substanzen und ihre Verwendung als InterferometerspiegelAnnalen der Physik, 1960