Recent Progress in Excimer Laser Lithography
- 1 January 1987
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Performance Evaluation Of A Practical 248nm Wafer StepperPublished by SPIE-Intl Soc Optical Eng ,1987
- Excimer Laser Stepper For Submicron LithographyPublished by SPIE-Intl Soc Optical Eng ,1987
- Submicron Optical Lithography Using A KrF Excimer Laser Projection Exposure SystemPublished by SPIE-Intl Soc Optical Eng ,1987
- Deep uv submicron lithography by using a pulsed high-power excimer laserJournal of Applied Physics, 1982
- Photosolubility of diazoquinone resistsIEEE Transactions on Electron Devices, 1980
- High resolution, steep profile resist patternsJournal of Vacuum Science and Technology, 1979