On the Work Function Difference in the Al ‐ SiO2 ‐ Si System with Reactively Sputtered SiO2
- 1 May 1979
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 126 (5) , 878-880
- https://doi.org/10.1149/1.2129160