Influence of substrate and target temperatures on properties of transparent and conductive doped ZnO thin films prepared by r.f. magnetron sputtering
- 1 April 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 171 (2) , 307-311
- https://doi.org/10.1016/0040-6090(89)90637-8
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology
This publication has 7 references indexed in Scilit:
- Highly Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1986
- The stability of aluminium-doped ZnO transparent electrodes fabricated by sputteringThin Solid Films, 1986
- Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1985
- Highly conductive and transparent ZnO thin films prepared by r.f. magnetron sputtering in an applied external d.c. magnetic fieldThin Solid Films, 1985
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysisThin Solid Films, 1983
- Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic fieldApplied Physics Letters, 1982