Properties of reactively sputtered tungsten films in nitrogen and oxygen

• 1 November 1986
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 4  (6) , 3111-3116
• https://doi.org/10.1116/1.573638

Abstract

Keywords

• ELECTRIC CONDUCTIVITY
• NITROGEN
• PHYSICAL PROPERTIES
• CRYSTAL STRUCTURE
• HEAT TREATMENT
• MICROSTRUCTURES
• TRANSMISSION ELECTRON MICROSCOPY
• ELECTRON MICROSCOPY
• GRAIN SIZE
• ELECTRICAL RESISTANCE