Abstract
The base transit time expressions for SiGe base heterojunction bipolar transistors are presented including the accelerating field effects due to the base bandgap grading and doping grading, and the retarding field (opposing drift field) effect from the graded boron profile down towards the emitter. It is found that the retarding field exhibits 40–80% contribution to the base transit time, depending on the boron concentration near the emitter. The results of base transit time from these analytic expressions are unambiguously supported by the published simulation data.

This publication has 3 references indexed in Scilit: