Nano-field effect transistor with an organic self-assembled monolayer as gate insulator

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Abstract
We demonstrate the realization and functioning of a hybrid (organic/silicon) nanometer-size field effect transistor (nano-FET) having a gate length of 25 nm. The gate insulator is an organic self-assembled monolayer (SAM) of alkyltrichlorosilanes (∼2 nm thick). We have used densely packed SAMs with functionalized end groups (–CH3, –CH=CH2, –COOH) that all exhibit reduced leakage current density (10−8–10−5 A/cm2). This nano-FET is free of punchthrough down to 50 nm, and shows a good field effect behavior at 25 nm. This demonstrates the compatibility of these SAMs with semiconductor device processes and their wide capability for applications in nanometer-scale electronics.