Surface phonons in thin aluminum oxide films: Thickness, beam-energy, and symmetry-mixing effects

Abstract
The surface-phonon (Fuchs-Kliewer) modes of thin α-Al2 O3 films prepared on a Ru(001) substrate have been measured with high-resolution electron-energy-loss spectroscopy. An understanding of the differences in phonon spectra for thick cyrstals versus thin films is derived from calculations using dielectric theory and the infrared optical constants for α-Al2 O3. In addition to the three characteristic phonon modes assigned previously at ∼400, ∼650, and ∼900 cm1 for ∼10-Å aluminum oxide films, our experiments and theoretical modeling confirm the presence of an additional mode at ∼800 cm1 and the splitting of the 400-cm1 feature into two peaks at about 350 and 500 cm1 for our somewhat thicker 30-Å well-annealed α-Al2 O3 films. The primary beam-energy dependence for the ∼900-cm1 phonon is found experimentally to be E0.9 while the dielectric theory predicts E0.8, in contrast to the well known E0.5 dependence for bulk ionic crystals. The 800- and 900-cm1 features are related to the high-frequency surface-phonon branches corresponding to the 650-cm1 bulk TO modes and are expected from dielectric theory for an ideal alumina layer on metal support. The 350-, 500-, and 650-cm1 modes are related to the low-frequency surface-phonon branches, which are allowed due to a (ω,k)-dependent dispersion-related symmetry-mixing process. Successful modeling of these latter modes is carried out under the assumption of a ‘‘self-supported’’ alumina film.