The use of H2 and NH3 ion implantation in the passivation of defects in silicon ribbon grown by the ribbon-against-drop technique
- 1 May 1985
- journal article
- Published by Elsevier in Solar Cells
- Vol. 14 (2) , 157-166
- https://doi.org/10.1016/0379-6787(85)90038-9
Abstract
No abstract availableKeywords
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