Impedance analysis of plasma-enhanced chemical-vapour-deposited TiO2 film in 0.1 M NaOH solution near the flat-band potential
- 31 March 1994
- journal article
- Published by Elsevier in Journal of Alloys and Compounds
- Vol. 205 (1-2) , 53-57
- https://doi.org/10.1016/0925-8388(94)90765-x
Abstract
No abstract availableKeywords
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