CNx thin films obtained by laser induced CVD in different gas–substrate systems
- 1 February 1997
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 109-110, 544-548
- https://doi.org/10.1016/s0169-4332(96)00632-0
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Characteristics of carbon nitride films synthesized by single-source ion beam enhanced deposition systemApplied Physics Letters, 1996
- Is carbon nitride harder than diamond? No, but its girth increases when stretched (negative Poisson ratio)Chemical Physics Letters, 1995
- Growth of CN films by reactive ionized cluster beam depositionJournal of Crystal Growth, 1995
- Formation of the crystalline β-C3N4 phase by dual ion beam sputtering depositionMaterials Letters, 1995
- IR and UV laser‐assisted deposition from titanium tetrachloride: A comparative studyAdvanced Materials for Optics and Electronics, 1995
- Carbon nitride formation by low-energy nitrogen implantation into graphiteThin Solid Films, 1994
- Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor depositionApplied Physics Letters, 1994
- Nano-indentation studies of ultrahigh strength carbon nitride thin filmsJournal of Applied Physics, 1993
- Characterization of Chemical-Vapor-Deposited Amorphous-Silicon FilmsJapanese Journal of Applied Physics, 1993
- Structural properties and electronic structure of low-compressibility materials: β- and hypothetical β-Physical Review B, 1990