Transmission electron microscopy study of cross-section microstructures of magnetron sputter ion-plated Al films on Ni substrate
- 1 July 1989
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 7 (4) , 2678-2680
- https://doi.org/10.1116/1.575773
Abstract
With cross-section samples, the microstructures of magnetron sputter ion-plated (MSIP) Al films on Ni substrates have been studied by transmission electron microscopy. The films consist of the three layers of microstructures: globular, columnar, and massive. An unknown phase in the Al–Ni system is also found at the interface between Al film and Ni substrate. By electron diffraction and energy dispersion x-ray analyses, it is identified as body-centered tetragonal with lattice constants a=b=0.588 nm, c=0.480 nm, and is rich in aluminum. Based on the observations and the character of the MSIP technique, the forming mechanism of Al films made by MSIP is discussed.Keywords
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