Diagnostics with series-connected Josephson tunnel junctions
- 1 January 1978
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 49 (1) , 338-343
- https://doi.org/10.1063/1.324392
Abstract
The prospect of incorporating Josephson tunnel junctions into future device technologies requires that fabrication procedures be developed which assure high junction yield, uniform quality, and reproducibility. Critical‐current distributions which are extracted from the I‐V characteristics of series‐connected lead and lead‐alloy junction arrays provide a quantitative measure of the yield, as revealed by a direct count of the 2Δ increments, and the quality or uniformity, as revealed by the width of the distribution. Examples of the effects of oxidation parameters, junction area, electrode thickness, magnetic fields, and thermal cycling on the critical‐current distributions demonstrate the ease in which significant statistical information on simultaneously prepared junctions is obtained. As a further illustration of the use of this diagnostic method, we present results on flux‐trapping experiments together with a preliminary survey of the effectiveness of a simple technique in which lead alloys are evaporated from a single source to completion and then oxidized in an acidic‐oxygen environment.This publication has 18 references indexed in Scilit:
- Tunneling between thin film superconductors containing single flux vorticesSolid State Communications, 1977
- Metallurgical considerations with respect to electrodes and interconnection lines for Josephson tunneling circuitsJournal of Vacuum Science and Technology, 1976
- Auger analysis of thin oxide films on Pb–In alloysThe Journal of Chemical Physics, 1975
- Coherent effects in series arrays of proximity effect superconducting bridgesIEEE Transactions on Magnetics, 1975
- Barrier formation in lead-based tunnel junctions studied by surface techniquesIEEE Transactions on Magnetics, 1975
- Fabrication of experimental Josephson tunneling circuitsJournal of Vacuum Science and Technology, 1974
- Masking of deposited thin films by means of an aluminum-photoresist compositeJournal of Vacuum Science and Technology, 1974
- Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External SurfacesPhysical Review B, 1970
- Potential of superconductive josephson tunneling technology for ultrahigh performance memories and processorsIEEE Transactions on Magnetics, 1969
- Physics of Preparation of Josephson BarriersJournal of Applied Physics, 1968