Processing conditions for polysilicon films with tensile strain for large aspect ratio microstructures
- 6 January 2003
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Mechanical properties of fine grained polysilicon-the repeatability issuePublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- The Controlled Etching of Silicon in Catalyzed Ethylenediamine‐Pyrocatechol‐Water SolutionsJournal of the Electrochemical Society, 1979