Plasma processing of niobium for the production of thin-film superconducting devices
- 1 January 1987
- Vol. 37 (3-4) , 331-334
- https://doi.org/10.1016/0042-207x(87)90019-4
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Plasma etching of niobium with CF4/O2 gasesJournal of Vacuum Science & Technology A, 1983
- Josephson junctions of small area formed on the edges of niobium filmsApplied Physics Letters, 1980
- Fabrication of Nb-NbOx-Pb Josephson tunnel junctions using rf glow-discharge oxidationJournal of Applied Physics, 1979
- Tunnel junction dc SQUID: Fabrication, operation, and performanceJournal of Low Temperature Physics, 1976
- Josephson Tunneling Barriers by rf Sputter Etching in an Oxygen PlasmaJournal of Applied Physics, 1971