Ablative photodecomposition of polymer films by pulsed far‐ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditions
- 1 October 1984
- journal article
- Published by Wiley in Journal of Polymer Science: Polymer Chemistry Edition
- Vol. 22 (10) , 2601-2609
- https://doi.org/10.1002/pol.1984.170221026
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Direct etching of polymeric materials using a XeCl laserApplied Physics Letters, 1983
- Kinetics of the ablative photodecomposition of organic polymers in the far ultraviolet (193 nm)Journal of Vacuum Science & Technology B, 1983
- Ablative photodecomposition: action of far-ultraviolet (193 nm) laser radiation on poly(ethylene terephthalate) filmsJournal of the American Chemical Society, 1982
- Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiationApplied Physics Letters, 1982