Plasma etching in integrated circuit manufacture—A review

• 1 January 1977
• journal article
• review article
• Published by American Vacuum Society in Journal of Vacuum Science and Technology
• Vol. 14  (1) , 266-274
• https://doi.org/10.1116/1.569137

Abstract

Keywords

• INTEGRATED CIRCUIT
• PLASMA ETCHING
• CIRCUIT MANUFACTURE
• REVIEW
• ETCHING IN INTEGRATED