Ultrathin oxide gate dielectrics prepared by low temperature remote plasma-assisted oxidation
- 31 January 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 98 (1-3) , 1529-1533
- https://doi.org/10.1016/s0257-8972(97)00389-7
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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