Profile Design Issues and Optimization of Epitaxial Si and SiGe-Base Bipolar Transistors and Circuits for 77K Applications
- 1 January 1991
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- The implementation of a reduced-field profile design for high-performance bipolar transistorsIEEE Electron Device Letters, 1990
- Scaling the silicon bipolar transistor for sub-100-ps ECL circuit operation at liquid nitrogen temperatureIEEE Transactions on Electron Devices, 1990
- Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor depositionApplied Physics Letters, 1986