Low Energy and High Dose Phosphorus Ion Implantation into Silicon through SiO2Film

• 1 December 1976
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 15  (12) , 2427-2432
• https://doi.org/10.1143/jjap.15.2427

Abstract

Keywords

• LOW ENERGY
• PHOSPHORUS ION IMPLANTATION
• DOSE PHOSPHORUS ION
• SILICON THROUGH SIO2FILM