Layer thicknesses in oxygen implantation of silicon
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 21 (1) , 158-162
- https://doi.org/10.1016/0168-583x(87)90817-2
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969