Metalorganic chemical vapor deposition of TiN films for advanced metallization
- 18 January 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (3) , 240-242
- https://doi.org/10.1063/1.108977
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Collimated magnetron sputter depositionJournal of Vacuum Science & Technology A, 1991
- Characterization of CVD-TiN Films Prepared with Metalorganic SourceJapanese Journal of Applied Physics, 1990
- Titanium Nitride Thin Films: Properties and Apcvd Synthesis Using Organometallic PrecursorsMRS Proceedings, 1989