Faraday communications. EXAFS evidence for the formation of a V2O5 thin film by chemical vapour deposition on SiO2
- 1 January 1991
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of the Chemical Society, Faraday Transactions
- Vol. 87 (11) , 1807-1808
- https://doi.org/10.1039/ft9918701807
Abstract
V K-edge EXAFS studies of V2O5/SiO2 catalysts prepared by a chemical vapour deposition (CVD) method demonstrate the formation of V2O5 thin films, while the V2O5 of V2O5/SiO2 prepared by an impregnation method is mainly in the form of microcrystallites.Keywords
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