Phosphorus diffusion effect on off-current of a-Si thin film transistors
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 1295-1298
- https://doi.org/10.1016/0022-3093(87)90310-3
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Defect model of charge transfer doping at a-SiNx:H/a-Si:H interfacesJournal of Non-Crystalline Solids, 1985
- The characteristics and properties of optimised amorphous silicon field effect transistorsApplied Physics A, 1983
- (Invited) Silicon TFTs for Flat Panel DisplaysJapanese Journal of Applied Physics, 1983
- Substitutional doping of amorphous siliconSolid State Communications, 1975