Metastable ion study of organosilicon compounds part II—hexamethyldisiloxane
- 1 January 1990
- journal article
- research article
- Published by Wiley in Journal of Mass Spectrometry
- Vol. 25 (1) , 39-43
- https://doi.org/10.1002/oms.1210250109
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Metastable ion study of organosilicon compounds. Part I—DiethoxydimethylsilaneJournal of Mass Spectrometry, 1989
- Positive and Negative Ion Chemistry of Silicon-Containing Molecules in the Gas PhasePublished by Wiley ,1989
- On the mechanism of CO loss from the metastable molecular ion of dimethyl malonateInternational Journal of Mass Spectrometry and Ion Processes, 1988
- Multiple bonding to siliconChemical Reviews, 1985
- Dissociation dynamics of energy-selected hexamethyldisilane ions and the heats of formation of trimethylsilyl(1+) ion ((CH3)3Si+) and trimethylsilyl radical ((CH3)3Si)Journal of the American Chemical Society, 1984
- Mass spectrometry of aryl substituted di- and trisiloxanesJournal of Mass Spectrometry, 1980
- Genesis of the trimethylsilyl cation in the electron impact mass spectra oft-butyldimethylsilyl derivativesJournal of Mass Spectrometry, 1977
- Silylumlagerungen in den Massenspektren stereoisomerer 5-Methylcyclohexan-1,3-diol-TMS-ätherJournal of Mass Spectrometry, 1975
- Mass spectrometric studies of thyroxine and related compounds. Trimethylsilyl derivativesJournal of Mass Spectrometry, 1974
- Methylgruppenwanderung bei der Elektronenstoßfragmentierung von TrimethyläthoxysilanZeitschrift für Chemie, 1970