NaNO2thin films for pyroelectric detector arrays
- 1 March 1989
- journal article
- research article
- Published by Taylor & Francis in Ferroelectrics
- Vol. 91 (1) , 113-125
- https://doi.org/10.1080/00150198908015732
Abstract
Integrated NaNO2 pyroelectric radiation detectors have been made by growing NaNO2-films from the melt directly on silicon. The pyroelectric signal is read out by an integrated circuit in the Si-substrate. The detectors, single element or arrays, can be coupled to the electronics in two ways, either by the ferroelectric field effect at the NaNO2-Si contact, or by separate MOS-FETs. The performance of the electrical coupling by the ferroelectric field effect is strongly limited by the trapping of charge in interface states. The performance of signal transfer to a MOS-FET is more efficient, but suffers from a large capacitive load, if the gate of the MOS-FET is connected to the lower detector electrode formed by metallization on the silicon chip. Impedance matching therefore requires a small thickness of the NaNO2-film. A small thickness, on the other hand, favors the penetration of the temperature wave into the substrate with the accompanying heat loss. Electrical and thermal optimization are thus contradictory. A solution could be to remove part of the silicon underneath the detector area.Keywords
This publication has 7 references indexed in Scilit:
- Pyroelectric devices and materialsReports on Progress in Physics, 1986
- Preparation and basic properties of PbTiO3ferroelectric thin films and their device applicationsFerroelectrics, 1985
- The pyroelectric/CCD focal plane hybrid: Analysis and design for direct charge injectionInfrared Physics, 1982
- A brief guide to pyroelectric detectorsFerroelectrics, 1981
- Ferroelectric properties of thin NaNO2–layersFerroelectrics, 1981
- Ferroelectric Properties of Tri-glycine Sulphate Thin FilmsJournal of Vacuum Science and Technology, 1973
- Ion Transport Phenomena in Insulating FilmsJournal of Applied Physics, 1965