Effect of total gas and oxygen partial pressure during deposition on the properties of sputtered V2O5 thin films
- 31 May 2005
- journal article
- Published by Elsevier in Solid State Ionics
- Vol. 176 (17-18) , 1627-1634
- https://doi.org/10.1016/j.ssi.2005.02.012
Abstract
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