Investigation of rotating d.c. discharge for diamond deposition
- 31 March 1993
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 2 (2-4) , 357-360
- https://doi.org/10.1016/0925-9635(93)90082-d
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Aspects of diamond deposition by anomalous pulsed d.c. glow-discharge-activated chemical vapor depositionSurface and Coatings Technology, 1991
- Growth of Diamond Thin Films by dc Plasma Chemical Vapor Deposition and Characteristics of the PlasmaJapanese Journal of Applied Physics, 1990
- The Importance of the Positively Charged Surface for the Epitaxial Growth of Diamonds at Low PressureJapanese Journal of Applied Physics, 1987