A continuous HF chemical laser: Production of fluorine atoms by a microwave discharge
- 1 January 1977
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 48 (1) , 224-229
- https://doi.org/10.1063/1.323323
Abstract
We have used a slow‐wave structure to dissociate SF6 and obtain the fluorine atoms for a cw hydrogen fluoride chemical laser. The laser output power has been observed to increase linearly with the absorbed microwave power. The effect of rare gases in the mixture is discussed. It is shown that the laser power increases linearly with their ionization potentials. Those features indicate that electron collisions are essential for the generation of fluorine atoms. In this respect, contributions involving metastable atoms are negligible. No simple relation is observed between the intensity of the fluorine spectral lines in the discharge and the laser power.This publication has 13 references indexed in Scilit:
- Compact continuous HF microwave-discharge mixing laserJournal of the Optical Society of America, 1975
- A Small Microwave Plasma Source for Long Column Production without Magnetic FieldIEEE Transactions on Plasma Science, 1975
- Simplified Model of CW Diffusion-Type Chemical LaserAIAA Journal, 1973
- Theory of an HF Chemical LaserCombustion Science and Technology, 1973
- WB4--A spectroscopic study of CW chemical lasersIEEE Journal of Quantum Electronics, 1973
- Closed-Form Solution to Rate Equations for an F + H_2 Laser OscillatorApplied Optics, 1972
- The Large Volume Microwave Plasma Generator (LMP™): A New Tool for Research and Industrial Processing*Journal of Microwave Power, 1972
- Erratum: Classical Trajectory Analysis of the Reaction F+H2 → HF+HThe Journal of Chemical Physics, 1972
- Analytical model for a continuous chemical laserJournal of Quantitative Spectroscopy and Radiative Transfer, 1971
- Continuous Wave Chemical Laser for Laser-Induced Fluorescence StudiesReview of Scientific Instruments, 1971